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Packaging Details : Standard Packaging
Model Number : MEL-AL-1018
Payment Terms : L/C,T/T
Place of Origin : Foshan, China
Price : Customized Price
Delivery Time : 60-90days
Brand Name : MEL-AL
Control Power : AC220V 50Hz
MOQ : 1set
This fully automatic clean-type sulfuric acid anodizing line is engineered exclusively for high-purity aluminum semiconductor components. It produces uniform 8-15 μm natural clear oxide film without metallic salt dyeing contamination. The line supports hot water sealing or medium-temperature nickel-free sealing to meet strict semiconductor cleanliness and outgassing requirements.
| Item | Parameter |
|---|---|
| Applicable Workpiece | Semiconductor clean components, high-purity aluminum substrates |
| Anodizing Type | Low contamination sulfuric acid decorative anodizing |
| Oxide Film Thickness | 8-15 μm |
| Surface Appearance | Natural clear finish (no metallic salt coloring, zero ion contamination risk) |
| Sealing Options | Hot water sealing / Medium-temperature nickel-free sealing |
| Operation Mode | Fully automatic clean anodizing line |
| Cleanliness Control | Low-ion bath formulation, dedicated clean circulation & filtration system |
| Key Restriction | Dyeing process prohibited to avoid heavy metal contamination |
Metal ions from colorants may remain inside the oxide film, causing ion migration, contamination and reliability risks for semiconductor assemblies. Natural clear anodizing is adopted.
Medium-temperature nickel-free sealing avoids nickel ion residue. It satisfies semiconductor requirements for low outgassing and heavy-metal-free surfaces.
The main configuration is fully automatic for mass production; a semi-automatic / manual clean module can be supplied as an optional upgrade for sampling orders.
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Semiconductor Grade Clean Component Sulfuric Acid Anodizing Line for High-Purity Aluminum Substrates Images |